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Nanosphere Lithography from Template-Directed Colloidal Sphere Assemblies

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Abstract:

Conventional nanosphere lithography holds the drawbacks of lacking precise control over the shape and architecture of the resultant nanostructures. In this work, nanoimprinting lithography was used to construct various desired patterns on a polymer film coated on a silicon substrate. The patterns were then used as templates to direct the self-assembly of silica colloidal spheres, forming colloidal assemblies with well-controlled sizes, shapes, and structures. Subsequent nanosphere lithography using template-directed colloidal sphere assemblies resulted in complex nanostructures that can not be obtained using the conventional nanosphere lithography method.

Keywords: COLLOIDAL SPHERE; NANOSPHERE LITHOGRAPHY; TEMPLATE-DIRECTED SELF-ASSEMBLY

Document Type: Research Article

DOI: http://dx.doi.org/10.1166/jnn.2006.227

Publication date: June 1, 2006

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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