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Functional Pattern Engineering in Glancing Angle Deposition Thin Films

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Abstract:

We present a new method for making functional patterns in thin films consisting of highly ordered arrays of complex, submicrometer structures, deposited at oblique flux incidence angles using the glancing angle deposition technique. By performing physical vapor deposition on direct write seed layers with intentional point and line lattice defects, we are able to generate embedded air-filled linear and planar patterns in the films in a single-step transfer approach with no need for conventional postdeposition micromachining. The uniformity and porosity of the thin films is fully maintained, with minimal impact on the film morphology adjacent to the patterns. This ability to engineer air-filled patterns is crucial to several promising thin-film applications, including photonic band gap crystals and microfluidics.

Keywords: ELECTRON BEAM LITHOGRAPHY; LASER DIRECT WRITE LITHOGRAPHY; MICROFLUIDICS; PERIODIC STRUCTURES; PHOTONIC BAND GAP CRYSTALS; PHYSICAL VAPOR DEPOSITION; POROUS MATERIALS; THIN FILMS; WAVEGUIDE

Document Type: Research Article

DOI: http://dx.doi.org/10.1166/jnn.2005.092

Publication date: May 1, 2005

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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