Authors: Sharma, Parmanand; Zhang, Wei; Amiya, Kenji; Kimura, Hisamichi; Inoue, Akihisa

Source: Journal of Nanoscience and Nanotechnology, Volume 5, Number 3, March 2005 , pp. 416-420(5)

Publisher: American Scientific Publishers

Abstract:

Completely glassy thin films of Zr-Al-Cu-Ni exhibiting a large super-cooled liquid region ( ΔT_x = 95 K), very smooth surface (R_a = 0.65 nm), and an extremely high value of Vicker's hardness (H_v = 940), as compared to bulk Zr-Al-Cu-Ni metallic glass, were deposited by radiofrequency magnetron sputtering. Nanoscale patterning ability of Zr-Al-Cu-Ni metallic glass thin films was demonstrated by a focused ion beam etching. The capability to write nanometer-scale patterns (line width ∼ 12 nm) opens up a variety of possibilities for fabricating nanomolds for imprint lithography, and a wide range of two- or three-dimensional components for future nanoelectromechanical systems.

Keywords: SPUTTERING; ZR-AL-CU-NI; NANOPATTERNING; METALLIC GLASS THIN FILMS; NANOMOLDS; FOCUSED ION BEAM ETCHING; ATOMIC FORCE MICROSCOPY

Document Type: Research article

DOI: http://dx.doi.org/10.1166/jnn.2005.055

Publication date: 2005-03-01

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