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Nanoscale Patterning of Zr-Al-Cu-Ni Metallic Glass Thin Films Deposited by Magnetron Sputtering

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Abstract:

Completely glassy thin films of Zr-Al-Cu-Ni exhibiting a large super-cooled liquid region ( ΔTx = 95 K), very smooth surface (Ra = 0.65 nm), and an extremely high value of Vicker's hardness (Hv = 940), as compared to bulk Zr-Al-Cu-Ni metallic glass, were deposited by radiofrequency magnetron sputtering. Nanoscale patterning ability of Zr-Al-Cu-Ni metallic glass thin films was demonstrated by a focused ion beam etching. The capability to write nanometer-scale patterns (line width ∼ 12 nm) opens up a variety of possibilities for fabricating nanomolds for imprint lithography, and a wide range of two- or three-dimensional components for future nanoelectromechanical systems.

Keywords: ATOMIC FORCE MICROSCOPY; FOCUSED ION BEAM ETCHING; METALLIC GLASS THIN FILMS; NANOMOLDS; NANOPATTERNING; SPUTTERING; ZR-AL-CU-NI

Document Type: Research Article

DOI: https://doi.org/10.1166/jnn.2005.055

Publication date: 2005-03-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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