Nanoscale Patterning of Zr-Al-Cu-Ni Metallic Glass Thin Films Deposited by Magnetron Sputtering

Authors: Sharma, Parmanand; Zhang, Wei; Amiya, Kenji; Kimura, Hisamichi; Inoue, Akihisa

Source: Journal of Nanoscience and Nanotechnology, Volume 5, Number 3, March 2005 , pp. 416-420(5)

Publisher: American Scientific Publishers

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Abstract:

Completely glassy thin films of Zr-Al-Cu-Ni exhibiting a large super-cooled liquid region ( ΔTx = 95 K), very smooth surface (Ra = 0.65 nm), and an extremely high value of Vicker's hardness (Hv = 940), as compared to bulk Zr-Al-Cu-Ni metallic glass, were deposited by radiofrequency magnetron sputtering. Nanoscale patterning ability of Zr-Al-Cu-Ni metallic glass thin films was demonstrated by a focused ion beam etching. The capability to write nanometer-scale patterns (line width ∼ 12 nm) opens up a variety of possibilities for fabricating nanomolds for imprint lithography, and a wide range of two- or three-dimensional components for future nanoelectromechanical systems.
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