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Preparation of Gold Nanoparticles on Silica Substrate by Radio Frequency Sputtering

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Abstract:

Radio frequency sputtering of gold on amorphous silica substrates was used for the preparation of Au nanoparticles on SiO2. Deposition experiments were carried out in Ar plasmas under mild conditions (RF power = 5÷10 W, total pressure = 0.38 mbar, substrate temperature ≤210 °C), focusing in particular on the effect of sputtering time (5÷30 min) and substrate temperature on gold nucleation and coalescence, with the aim of obtaining SiO2-supported Au nanoparticles characterized by precise structural and morphological features. To this aim, several analytical techniques were employed for a thorough characterization of the systems properties, including glancing incidence X-ray diffraction, transmission electron microscopy, X-ray photoelectron spectroscopy, atomic force microscopy, and UV-Vis absorption spectroscopy. In particular, the evolution of optical spectra, i. e., of the surface plasmon resonance peak, was used as a probe for the structural features and was related to the results obtained by other characterization techniques. Gold nanoclusters (   4÷10 nm) dispersed uniformly on silica matrices were obtained under soft conditions, with morphology ranging from island to cluster like. The obtained results make possible a careful modulation of substrate coverage and gold nanoparticle size.
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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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