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Temperature Effects on Resistance of Aligned Multiwalled Carbon Nanotube Films

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Abstract:

Electrical transport in vertically aligned films of multiwalled carbon nanotubes has been investigated in the -150 °C to 300 °C temperature range (all the tests were conducted in air at atmospheric pressure). In all the cases, the nanotube film exhibited a semi-conducting behavior, with the film resistance decreasing with increasing temperature. Removal of amorphous carbon contamination (via plasma etching) significantly improved the nanotube film's sensitivity to temperature changes (particularly in the 20 °C to 200 °C temperature range). All the of films tested in this study showed a consistent, repeatable behavior that was independent of the nanotube film length. The temperature sensitivity of the nanotube films was also found to be independent of the heating/ cooling rates and without hysteresis. Because of the excellent repeatability and stability of the results, it is conceived that miniaturized temperature sensors could be designed using such aligned multiwalled nanotube films.

Keywords: CHEMICAL VAPOR DEPOSITION; ELECTRICAL TRANSPORT; MULTIWALLED CARBON NANOTUBES; RESISTIVITY; TEMPERATURE SENSOR

Document Type: Research Article

DOI: http://dx.doi.org/10.1166/jnn.2004.109

Publication date: September 1, 2004

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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