Dip-Pen Nanolithography with Poly(Diallyl dimethyl ammonium) Chloride
Poly(diallyl dimethyl ammonium) chloride (PDAC), a high molecular weight cationic polyelectrolyte, was used as ink for dip-pen nanolithography. Line patterns were generated on bare silicon wafers directly with PDAC-coated tips. Widths and heights of lines increased with decreasing scan rates. At the same scan rate, widths and heights of patterning decreased with increasing PDAC molecular weight. The dependence of line width on inverse writing speed was found to be consistent with a modified diffusion model.
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Document Type: Research Article
Publication date: 2004-03-01
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