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Dip-Pen Nanolithography with Poly(Diallyl dimethyl ammonium) Chloride

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Abstract:

Poly(diallyl dimethyl ammonium) chloride (PDAC), a high molecular weight cationic polyelectrolyte, was used as ink for dip-pen nanolithography. Line patterns were generated on bare silicon wafers directly with PDAC-coated tips. Widths and heights of lines increased with decreasing scan rates. At the same scan rate, widths and heights of patterning decreased with increasing PDAC molecular weight. The dependence of line width on inverse writing speed was found to be consistent with a modified diffusion model.

Keywords: DIFFUSION MODEL; DIP-PEN NANOLITHOGRAPHY; MOLECULAR WEIGHT; POLYELECTROLYTE

Document Type: Research Article

DOI: http://dx.doi.org/10.1166/jnn.2004.026

Publication date: March 1, 2004

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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