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A novel approach to generating clear patterns of different types of nanoparticles is presented in this paper. Nanoassembly in the vertical direction was combined with planar micropatterning. This provides industrial applications of a popular layer-by-layer method to produce multilayers of polymers, nanoparticles, and proteins organized on the nanometer scale. A thin film of organic polystyrene spheres was first coated on the pretreated silicon wafer with layer-by-layer self-assembly. Then a layer of aluminum was deposited on the thin film. A layer of positive photoresist was spun on the surface of aluminum and then illuminated with UV light. The exposed parts of the resist were removed and windows were opened above the aluminum. The subsequent etching removed exposed aluminum and left a polystyrene thin film in the open windows. Oxygen plasma was employed to remove the polystyrene thin film on the bottom. Eventually, aluminum and photoresist were removed and only the desired pattern remained. This approach was also employed for the patterning of the silica nanoparticle thin film, a widely used material in various applications. In this case, wet etching was demonstrated to etch silica particles. A scanning electron microscope was used to produce the image of the pattern.
Institute for Micromanufacturing, Louisiana Tech University, Ruston, Louisiana, USA
Publication date: July 1, 2002
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Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.