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Fabrication of Ordered Arrays of InP Microstructures by Wet Chemical Etching with Au Masks

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Ordered arrays of InP microstructures have been fabricated on InP(001) substrates by wet chemical etching in aqueous HCl with patterned Au masks. The masks were produced by Au deposition through copper grids or a monolayer of polystyrene microspheres. Square InP mesas (20 × 20 m) and pillars (~100 nm in both diameter and height) were both produced and characterized by scanning electron microscopy and atomic force microscopy.
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Keywords: INP; LITHOGRAPHY; MICROFABRICATION; SELF-ORGANIZATION; WET CHEMICAL ETCHING

Document Type: Research Article

Affiliations: Nanoscale Physics Research Laboratory, School of Physics and Astronomy, The University of Birmingham, Edgbaston, Birmingham B15 2TT, United Kingdom

Publication date: 2002-12-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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