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Plasma-Enhanced Chemical Vapor Deposition of Multiwalled Carbon Nanofibers

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Abstract:

Plasma-enhanced chemical vapor deposition is used to grow vertically aligned multiwalled carbon nanofibers (MWNFs). The graphite basal planes in these nanofibers are not parallel as in nanotubes; instead they exhibit a small angle resembling a stacked cone arrangement. A parametric study with varying process parameters such as growth temperature, feedstock composition, and substrate power has been conducted, and these parameters are found to influence the growth rate, diameter, and morphology. The well-aligned MWNFs are suitable for fabricating electrode systems in sensor and device development.

Keywords: Carbon Nanotubes; Multiwall; Nanodevice Fabrication.; Plasma Deposition; Tip Growth; Vertical Alignment

Document Type: Research Article

DOI: https://doi.org/10.1166/jnn.2002.133

Affiliations: 1: NASA Ames Research Center, Moffett Field, California, USA 2: ELORET Corporation

Publication date: 2002-10-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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