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Grain Growth in Nanocrystalline Yttrium-Stabilized Zirconia Thin Films Synthesized by Spin Coating of Polymeric Precursors

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Abstract:

This article reports results of experimental studies on the microstructural evolution of nanocrystalline yttrium-stabilized zirconia thin films synthesized on a Si substrate via a polymeric precursor spincoating approach. Grain growth behavior has been investigated at different annealing temperatures (700-1200 °C) for periods of up to 240 h. A similar film thickness (~120 nm) was maintained for all of the samples used in this study, to avoid variation in film thickness-dependent grain growth. The effects of the thermal history of the film and the annealing atmosphere on the grain growth were also studied. A simple semiempirical grain growth model has been developed to describe isothermal annealing data and to predict dynamic grain growth behavior during the sintering of polymeric precursor layers to form cubic-phase nanocrystalline yttrium-stabilized zirconia films.

Keywords: FUEL CELLS; GRAIN GROWTH; NANOCRYSTALLINE FILM; SOL-GEL COATING; SOLID ELECTROLYTE; YSZ THIN FILM

Document Type: Research Article

DOI: http://dx.doi.org/10.1166/jnn.2002.082

Affiliations: 1: Chemical Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831 2: Metals and Ceramics Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831

Publication date: April 1, 2002

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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