Replication Molds Having Nanometer-Scale Shape Control Fabricated by Means of Oxidation and Etching
Abstract:A means of accurate control of the curvature radius of molds that are used in nanostructure replication techniques is presented. The local non-uniform growth of SiO2 at regions with high curvature is used to fabricate molds with a curvature radius ranging anywhere between 10 and 250 nm. The mold radius is predicted by numerical simulation as a function of oxidation temperature and time and confirmed by a series of oxidation and etching experiments. The silicon, silicon dioxide, and polymer nanostructures are analyzed by scanning electron microscopy and compared with the theory. Replication into photo-plastic polymer from various sharp and round molds is performed, and their properties are discussed. Our results are useful for designing nanostructures in the area of soft lithography and nanoprobe engineering.
Document Type: Research Article
Affiliations: 1: Institute of Microelectronics and Microsystems, Ecole Polytechnique Fédérale de Lausanne (EPFL), 1015 Lausanne, Switzerland 2: Semiconductor Components Laboratory, MESA+ Research Institute, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands
Publication date: February 1, 2002
- Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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