Thermal Stability of Nanocrystalline Diamond Films Grown by Biased Enhanced Microwave Plasma Chemical Vapor Deposition
Abstract:The thermal stability of nanocrystalline diamond (NCD) films grown on mirror-polished silicon substrates by biased enhanced microwave plasma chemical vapor deposition was investigated. Different pieces of a NCD sample were annealed for 1 h in an ambient argon atmosphere at 200, 400, 600, and 800 °C. The structural and mechanical properties of as-grown and annealed samples were assessed. The surface roughness and high hardness of the samples remained fairly constant with annealing temperature.
Document Type: Communications
Affiliations: 1: Department of Environmental Technology and Urban Planning, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466 8555, Japan 2: Department of Electronics, Chubu University, 1200, Matsumoto-cho, Kasugai, Aichi 487-8501, Japan
Publication date: September 1, 2001
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