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Thermal Stability of Nanocrystalline Diamond Films Grown by Biased Enhanced Microwave Plasma Chemical Vapor Deposition

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The thermal stability of nanocrystalline diamond (NCD) films grown on mirror-polished silicon substrates by biased enhanced microwave plasma chemical vapor deposition was investigated. Different pieces of a NCD sample were annealed for 1 h in an ambient argon atmosphere at 200, 400, 600, and 800 °C. The structural and mechanical properties of as-grown and annealed samples were assessed. The surface roughness and high hardness of the samples remained fairly constant with annealing temperature.
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Keywords: CHEMICAL VAPOR DEPOSITION; HARDNESS; NANOCRYSTALLINE DIAMOND FILMS; SURFACE ROUGHNESS; THERMAL STABILITY

Document Type: Communications

Affiliations: 1: Department of Environmental Technology and Urban Planning, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466 8555, Japan 2: Department of Electronics, Chubu University, 1200, Matsumoto-cho, Kasugai, Aichi 487-8501, Japan

Publication date: 2001-09-01

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  • Journal for Nanoscience and Nanotechnology (JNN) is an international and multidisciplinary peer-reviewed journal with a wide-ranging coverage, consolidating research activities in all areas of nanoscience and nanotechnology into a single and unique reference source. JNN is the first cross-disciplinary journal to publish original full research articles, rapid communications of important new scientific and technological findings, timely state-of-the-art reviews with author's photo and short biography, and current research news encompassing the fundamental and applied research in all disciplines of science, engineering and medicine.
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