Microfabrication of a Free-Standing NiW Alloy Film as a Wavelength-Selective Surface
We here report a method for fabricating a heat-resistant alloy based on NiW electroplating and silicon lost-molding processes. A periodic micropattern was fabricated on a silicon mold by electron-beam lithography and deep reactive-ion etching. A heat-resistive NiW alloy film with a thickness of 2.1 μm was subsequently electroplated onto an Au seed layer deposited on the silicon mold, following which the silicon mold was finally etched, and a free-standing NiW alloy film was released. The NiW film was characterized by energy-dispersive X-ray spectrometry and Fourier transform infrared spectrophotometer. The film contained 24.6 at% tungsten, and its melting point was estimated to be 1675 °C. Modification of the film's spectral reflectivity was confirmed, and an emission peak at 1.4 μm was observed; This emission wavelength agrees well with the absorption band of a conventional infrared photovoltaic cell of Ge. Thermophotovoltaic power generation was demonstrated using a Ge photodiode and Joule heating of the micropatterned NiW film, and a radiation efficiency of 9.13 × 10–6 was achieved.
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Document Type: Research Article
Publication date: 01 May 2015
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- Journal of Computational and Theoretical Nanoscience is an international peer-reviewed journal with a wide-ranging coverage, consolidates research activities in all aspects of computational and theoretical nanoscience into a single reference source. This journal offers scientists and engineers peer-reviewed research papers in all aspects of computational and theoretical nanoscience and nanotechnology in chemistry, physics, materials science, engineering and biology to publish original full papers and timely state-of-the-art reviews and short communications encompassing the fundamental and applied research.
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