Sequential Nano-Patterning Using Electron and Laser Beams: A Numerical Methodology
Authors: Wong, Basil T.; Mengüç, M. Pinar; Vallance, R. Ryan
Source: Journal of Computational and Theoretical Nanoscience, Volume 3, Number 2, April 2006 , pp. 219-230(12)
Publisher: American Scientific Publishers
Key:
- Free Content
- New Content
- Subscribed Content
- Free Trial Content
- Free Content
- New Content
- Subscribed Content
- Free Trial Content
Abstract:
A methodology is presented for nanometer-size patterning of a workpiece using both an electron-beam and a laser. A Monte Carlo/Ray Tracing technique is used in modeling the electron-beam propagation inside a thin gold film. This approach is identical to that of a typical Monte Carlo simulation in radiative transfer except that proper electron scattering properties are employed. The laser propagation within the one-dimensional, non-scattering film on top of a quartz substrate is modeled using a ray-tracing approach and reflections at the boundaries are accounted for with the Fresnel-expressions. The temperature distribution inside a gold film is then predicted using the Fourier law of heat conduction, after evaluating the accuracy of the model for the range considered. A sequential nano-pattern is created using these coupled numerical simulations. The procedure we present here is the first to outline the sequential nano-machining processes and likely to guide the experimental studies to success with less trial-and-error attempts.Keywords: ELECTRON-BEAM PROPAGATION; MONTE CARLO; NANO-MACHINING; MATERIAL PROCESSING; THERMAL CONDUCTION
Document Type: Research article
DOI: 10.1166/jctn.2006.003
Key:
- Free Content
- New Content
- Subscribed Content
- Free Trial Content
- Free Content
- New Content
- Subscribed Content
- Free Trial Content
Click here for Page Help