Ta/BDD Film Electrode for Electrochemical Oxidation Nitrophenol
The physical and electrochemical behaviors of the tantalum substrate born-doped diamond (Ta/BDD)electrode prepared by hot filament chemical vapor deposition (HFCVD) technique and its application in electrochemical oxidation of wastewater containing nitrophenol were studied. Raman spectroscopy
and scanning electron microscopy (SEM) examinations demonstrated that the electrode had well-defined diamond features. It was observed that the Ta/BDD electrode had a much higher overpotential for water electrolysis prohibiting the evolution of oxygen in the cyclic voltammetry test. During
the electrochemical oxidation of wastewater containing nitrophenol, the results obtained by high performance liquid chromatography (HPLC) and chemical oxygen demand (COD) tests showed that the electrochemical process was suitable for completely degrading nitrophenol. The influence of current
density, temperature, support electrolyte, and electrolyte concentration was investigated in order to find the best conditions for COD removal. Good electrochemical stability of Ta/BDD electrode was obtained in the accelerated life test. According to the results, Ta/BDD anode is consitered
to be a unique electrode for the degradation of nitrophenol and COD simultaneously.
Keywords: Electrochemical oxidation; Nitrophenol; Tantalumsubstrate boron-doped diamond thin filmelectrode; Wastewater treatment
Document Type: Research Article
Publication date: 15 November 2008
- Acta Physico-Chimica Sinica, founded in 1985, is sponsored by the Chinese Chemical Society and organized by the College of Chemistry and Molecular Engineering, PekingUniversity. Since 1997, Acta Physico-Chimica Sinica has been indexed in SCI of ISI (US). Acta Physico-Chimica Sinica is devoted to reporting new and original experimental and theoretical basic research of interest to physical chemists, biophysical chemists, and material physical chemists. Manuscripts that are essentially reporting data, applications of data, or reviews of the literature are not suitable for publication in Acta Physico-Chimica Sinica.
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