Electrical Properties of 10-nm-Radius n-Type Gate All Around Twin Si Nanowire Field Effect Transistors

The electrical properties of 10-nm-radius n-type gate all around (GAA) twin Si nanowire field effect transistors (TSNWFETs) and field effect transistors (FETs) without nanowires were investigated to understand their device characteristics. The electrical characteristics of the GAA TSNWFETs and FETs with bulk boron concentrations of 1×10₁₈ and 1×10₁₆ cm_-3 were simulated by using threedimensional technology computer-aided design simulation tools of sentaurus taking into account quantum effects. The simulation results showed that the on-current level of the TSNWFETs was larger than that of FETs, and the subthreshold swing and the drain induced barrier lowing of the TSNWFETs were smaller than those of FETs. The current density and conduction band edge profiles in the TSNWFETs clarified the dominant current paths. The simulation results showed that the on-current/off-current ratio increased with increasing bulk boron concentration, and the stand-by current level decreased.